| 摘要 |
<P>PROBLEM TO BE SOLVED: To reduce the amount of liquid scattering from the gap between the end surface of a projection optical system and a substrate, in an exposure apparatus to which immersion method is applied. <P>SOLUTION: This exposure apparatus exposes the substrate via an original plate under the conditions where liquid is filled in the gap between the substrate and the end surface of the projection optical system. The exposure apparatus is equipped with a substrate stage that holds and moves the substrate, a supply means for supplying a liquid to the gap between the substrate held by the substrate stage and the end surface of the projection optical system via a supply nozzle, and recovery means to collect the liquid filled in the gap through the recovery nozzle of the projection optical system arranged outside of the supply nozzle. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
