发明名称 |
WAFER STORAGE DEVICE, WAFER STORAGE METHOD, WAFER CARRYING DEVICE, AND WAFER CARRYING METHOD |
摘要 |
<P>PROBLEM TO BE SOLVED: To prevent a pattern formation fault such as a wiring short circuit by preventing particles from adhering to a wafer carried through a wafer retaining vessel such as a wafer cassette in the wafer retaining vessel. <P>SOLUTION: A wafer storage device 20 for storing the wafer 4 among a plurality of wafer treatment processes comprises a wafer cassette 1 for retaining the wafer 4 in a direction in which a wafer surface 4a is along the upper and lower directions; an air current generation mechanism composed of an air current intake 23a for allowing air currents in upper and lower directions to flow in the wafer cassette 1, an exhaust vent 24a, and the like; and an ionization mechanism 22 for ionizing the air current at the upstream of the wafer cassette 1, thus preventing particles in the atmosphere in the wafer cassette 11 and that adhering to the other wafer 4 in the plurality of retained wafers 4 from falling on the wafer surface 4a by gravity, and preventing electrostatic attraction to the wafer surface 4a. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
申请公布号 |
JP2006032869(A) |
申请公布日期 |
2006.02.02 |
申请号 |
JP20040213692 |
申请日期 |
2004.07.22 |
申请人 |
MATSUSHITA ELECTRIC IND CO LTD |
发明人 |
ITO YASUAKI;IHARA ISAO;ARAKAWA HIROSHI;TANAKA TADANOBU |
分类号 |
H01L21/673;H01L21/027;H01L21/677;H05F3/04 |
主分类号 |
H01L21/673 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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