| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure device using an F2 laser, which can measure the quantity of exposure light without extracting several percent of a laser beam having a wavelength of 157.6 nanometers, reduce a throughput, and suppress increase of a running cost. <P>SOLUTION: By extracting and measuring only red color light and infrared light oscillated having wavelengths of 600 nanometers or higher other than a wavelength of 157 namometers used for exposure unique to an F2 laser, the quantity of exposure light having the wavelength of 157 nanometers is relatively measured. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
