| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processing apparatus capable of easily replacing a blowout heating lamp. SOLUTION: A CVD apparatus 10 comprises a process tube 11 configuring a wafer process chamber 14, a plurality of the heating lamps 42 for emitting heat rays, and a reflector 47 for reflecting the heat rays of the heating lamps 42 in a direction of the process chamber 14. A group of the heating lamps 42 is vertically arranged, and a heating lamp support device 70 located to upper and lower parts of the reflector 47 supports the heating lamps 42. A retainer 74 energized by springs 78 supported by a cap 77, whereby the reaction force is obtained, is inserted to each of guide holes 72 opened to a support ring 71 of each of the heating lamp support devices 70 at an equal interval in its circumferential direction. A part 42b to be supported of each of the heating lamps 42 is supported between the retainer 74 and the guide hole 72, and a male connector 42a is connected to a female connector 80. Support of the part 42b to be supported is released by moving the retainer 74 and a blowout heating lamp 42 can be replaced by extracting it radially. COPYRIGHT: (C)2006,JPO&NCIPI
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