| 发明名称 |
Lithographic apparatus and device manufacturing method |
| 摘要 |
In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between said structure and the surface of said substrate to contain liquid in the space.
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| 申请公布号 |
US2006023189(A1) |
申请公布日期 |
2006.02.02 |
| 申请号 |
US20050239493 |
申请日期 |
2005.09.30 |
| 申请人 |
ASML NETHERLANDS B.V. |
发明人 |
LOF JOERI;DERKSEN ANTONIUS THEODORUS A.M.;HOOGENDAM CHRISTIAAN A.;KOLESNYCHENKO ALEKSEY;LOOPSTRA ERIK R.;MODDERMAN THEODORUS M.;MULKENS JOHANNES CATHARINUS H.;RITSEMA ROELOF AEILKO S.;SIMON KLAUS;DE SMIT JOANNES T.;STRAAIJER ALEXANDER;STREEFKERK BOB;SANTEN HELMAR V. |
| 分类号 |
G03B27/42;G03F7/20;G03F9/00;H01L21/027 |
主分类号 |
G03B27/42 |
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