发明名称 NICKEL-COATED FREE-STANDING SILICON CARBIDE STRUCTURE FOR SENSING FLUORO OR HALOGEN SPECIES IN SEMICONDUCTOR PROCESSING SYSTEMS, AND PROCESSES OF MAKING AND USING SAME
摘要 A (MEMS)-based gas sensor assembly (35) for detecting a fluorine-containing species in a gas containing same, e.g., an effluent of a semiconductor processing tool undergoing etch cleaning with HF, NF3, etc. Such gas sensor assembly in a preferred embodiment comprises a free-standing silicon carbide (4) support structure having a layer of a gas sensing material, preferably nickel or nickel alloy, coated thereon. Such gas sensor assembly is preferably fabricated by micro-molding techniques employing sacrificial molds (16) that are subsequently removable for forming structure layers.
申请公布号 WO2005081931(A3) 申请公布日期 2006.02.02
申请号 WO2005US05607 申请日期 2005.02.23
申请人 ADVANCED TECHNOLOGY MATERIALS, INC.;DIMEO, FRANK, JR.;CHEN, PHILIP, S.H.;CHEN, ING-SHIN;NEUNER, JEFFREY, W.;WELCH, JAMES 发明人 DIMEO, FRANK, JR.;CHEN, PHILIP, S.H.;CHEN, ING-SHIN;NEUNER, JEFFREY, W.;WELCH, JAMES
分类号 G01N33/00 主分类号 G01N33/00
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