发明名称 |
SILICA SOL AND PROCESS FOR PRODUCING THE SAME |
摘要 |
<p>[PROBLEMS] To provide a silica sol which is suitable for use as a material for, e.g., an abrasive material for electronic materials, silicon wafers, and the like which are required to have a high purity, has excellent sol stability, can hence be easily made to have an increased silica concentration, and can be regulated so as to have a silica concentration equal to or higher than that of silica sols produced from water glass. [MEANS FOR SOLVING PROBLEMS] The silica sol comprises water and fine silica particles dispersed therein, and is characterized in that the fine silica particles have a secondary-particle diameter of 10-1,000 nm, a metal impurity content of 1 ppm or lower, and a silica concentration of 10-50 wt.%. Also provided is a process for producing a stable silica sol characterized by comprising the following steps (a) and (b). (a) A first step in which a hydrolyzable silicon compound is hydrolyzed and condensation-polymerized to produce a silica sol. (b) A second step in which the silica sol obtained in the first step is concentrated to a silica concentration not higher than a certain value according to the particle diameter and the dispersion medium and alkali catalyst in the silica sol are replaced with water to regulate the pH to 6.0-9.0.</p> |
申请公布号 |
WO2006011252(A1) |
申请公布日期 |
2006.02.02 |
申请号 |
WO2005JP00551 |
申请日期 |
2005.01.18 |
申请人 |
FUSO CHEMICAL CO. LTD.;YAMAKAWA, YASUHIRO;TOMODA, YOSHIAKI;TOYAMA, KEIJI;SAKAI, MASATOSHI |
发明人 |
YAMAKAWA, YASUHIRO;TOMODA, YOSHIAKI;TOYAMA, KEIJI;SAKAI, MASATOSHI |
分类号 |
(IPC1-7):C01B33/141 |
主分类号 |
(IPC1-7):C01B33/141 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|