| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a new protective film forming composition for forming a protective film which can be stripped with a developing solution in liquid immersion exposure, which shows excellent coating uniformity on a resist film, which reduces the number of particles produced after storage with time and which can improve the sensitivity of an underlayer resist composition. <P>SOLUTION: This protective film forming composition contains (A) a resin insoluble in water and soluble in alkali, and (B) a solvent, and also contains metal impuriies of ≤100 ppb. This pattern forming method is carried out by using the composition. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
