| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photomask improved in use efficiency of light which is a problem of conventional techniques. <P>SOLUTION: A polarizing mask and a polarizing phase shift mask having excellent use efficiency of light can be produced by providing a conventional photomask or a phase shift mask with a structural polarizing element having better use efficiency of light which controls a polarized light component in a specified direction. Specifically, by using a structural birefringent element or a photonic crystal for a photomask, use efficiency of light can be improved and throughput of an exposure step can be increased. Observation of a developed resist pattern results in that no resist residue indicating phase conflict as a conventional problem is observed. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
