发明名称 PHOTOELECTRON DEVICE AND MANUFACTURING METHOD OF PHOTOELECTRON DEVICE
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a capping layer, a photoelectron device having a capping layer with which it is easy to adjust an optical property, a manufacturing method of the photoelectron device and a method to specify a refractive index of the capping layer. <P>SOLUTION: The photoelectron device is equipped with photoelectron members (12, 14, 16) to emit light, a light emission surface (22) and a capping layer (18) on the light emission surface (22). The capping layer (18) contains a mixture of a first material having a first refractive index and a second material having a second refractive index. <P>COPYRIGHT: (C)2006,JPO&NCIPI</p>
申请公布号 JP2006032333(A) 申请公布日期 2006.02.02
申请号 JP20050183456 申请日期 2005.06.23
申请人 INTERNATL BUSINESS MACH CORP <IBM> 发明人 MARX GEBHARD;ALLENSPACH ROLF;RIESS WALTER
分类号 H05B33/02;H01L51/50;H05B33/10;H05B33/22 主分类号 H05B33/02
代理机构 代理人
主权项
地址