| 摘要 |
PROBLEM TO BE SOLVED: To accurately measure repeatable run-out RRO by suitably drawing a measured circle enlarging observable by an SEM or the like, and to improve the drawing roundness by drawing compensation, in measuring the run-out of a rotation stage. SOLUTION: An exposure apparatus 40 exposes a predetermined pattern by irradiating a substrate 11 mounted on the rotation stage 41 with a deflected and controlled beam EB. The exposure apparatus 40 irradiates the proximity of the rotation center on the substrate 11 while rotating the rotation stage 41, draws a small-diameter measured circle 5 entirely and enlarging observable by the SEM or the like on the substrate 11, measures the repeatable run-out RPO by measurement of the measured circle 5, and reflects it to an actual drawing. COPYRIGHT: (C)2006,JPO&NCIPI
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