发明名称 Semiconductor integrated circuit device
摘要 The present invention provides a semiconductor integrated circuit device having an SRAM in which leak current is reduced. In an SRAM comprising a plurality of memory cells each constructed by a storage in which input and output terminals of two inverter circuits are cross-connected and a selection MOSFET provided between the storage and complementary bit lines and whose gate is connected to a word line, a substrate bias switching circuit is provided. In normal operation, the substrate bias switching circuit supplies a power source voltage to an N-type well in which a P-channel MOSFET of a memory cell is formed and supplies a ground potential of the circuit to a P-type well in which an N-channel MOSFET is formed. In the standby state, the substrate bias switching circuit supplies a predetermined voltage which is lower than the power source voltage and by which a PN junction between the N-type well and the source of the P-channel MOSFET is not forward biased to the N-type well, and supplies a predetermined voltage which is higher than the ground potential and by which a PN junction between the P-type well and the source of the N-channel MOSFET is not forward biased to the P-type well.
申请公布号 US2006023520(A1) 申请公布日期 2006.02.02
申请号 US20050169800 申请日期 2005.06.30
申请人 RENESAS TECHNOLOGY CORP.. 发明人 MORI RYO;YAMADA TOSHIO;MURAYA TETSUYA
分类号 G11C5/14 主分类号 G11C5/14
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