| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a film formation method capable of efficiently forming a film using a carbon isotope as a main material, the film formed by the method, and electronic components and electronic equipment having the film. <P>SOLUTION: The film formation method is the one for forming the film 8 using the carbon isotope 82 as the main material, on a base material 5, by a chemical vapor deposition method using a compound 81 containing carbon and having an unsaturated bond, wherein the film 8 is formed by supplying a liquid material 80 made like a mist toward the base material 5 containing the compound 81 in a state in which a housing section 7 housing the liquid material 80 is opposed to the base material 5 through a space, and heating the liquid material 80 at the space, thereby changing the compound 81 at the space and/or on the base material 5 to the carbon isotope 82. <P>COPYRIGHT: (C)2006,JPO&NCIPI</p> |
