| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method of designing a charged particle beam mask, its design data structure, a charged particle beam mask, and a charged particle beam transferring method which enable die-to-die comparison inspection in a mask defect inspection, when forming a plurality of identical chips on a single mask. <P>SOLUTION: The charged particle beam mask designing method calculates the number of sub-fields sufficient to cover the total size of a chip pattern, divides the mask into a plurality of mask regions, each corresponding to the sub-field unit based thereon, and forms chip patterns on the respective mask regions, thus obtaining a charged particle beam mask, composed of the plurality of identical chip patterns formed at pitches of a multiple integer of the sub-field size on the mask. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
