| 摘要 |
PROBLEM TO BE SOLVED: To provide a manufacturing method for a thin-film element avoiding electrostatic breakdown and being capable of inhibiting insulation degradation or breakdown, the change of the resistance value of an element section or the like. SOLUTION: A conductor thin-film 50 electrically parallel with the element 33 is formed before a treatment process having a possibility generating charge. The conductor thin-film 50 has the resistance value lower than that of the element 33. The treatment process is carried out, the conductor thin-film 50 is dry-etched, and the conductor thin-film 50 is removed. COPYRIGHT: (C)2006,JPO&NCIPI
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