发明名称 CHARGED PARTICLE BEAM DEVICE AND MANUFACTURING METHOD OF MICRODEVICE
摘要 PROBLEM TO BE SOLVED: To provide a charged particle beam device where an optical axis is never deviated or an illumination condition is never changed even when energy of illuminating electrons is changed over. SOLUTION: By operating a deflector 16, the position of the luminous flux center of an illumination beam can be changed from a position shown by 4 to a position shown by 18. An auxiliary lens 17 is so arranged that its center axis coincide with the luminous flux center of an illumination beam 18, and is used for correcting the entry position to an electromagnetic prism 3 of the illuminating charged particle beam when its energy is changed. Although an irradiation beam entering into the electromagnetic prism 3 enters from two positions according to the difference of the energy, its position is selected at a position where the luminous flux center of the illumination beam in exiting the electromagnetic prism 3 coincides with the optical axis 19. Thereby, the sample 6 can be illuminated in a condition where influence of axis deviation is small even when the energy of the illumination beam is changed. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006032124(A) 申请公布日期 2006.02.02
申请号 JP20040209430 申请日期 2004.07.16
申请人 EBARA CORP;NIKON CORP 发明人 KANEMATSU ERIKA
分类号 H01J37/29;G03F7/20;H01J37/147;H01L21/027;H01L21/66 主分类号 H01J37/29
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