System for and method of ensuring accurate shadow mask-to-substrate registration in a deposition process

摘要

A deposition system uses the same low coefficient of thermal expansion (CTE) material, for example, a CTE of below 10 ppm/° C. in the temperature range of 0-200° C., for forming both a shadow mask and a substrate upon which depositions occur in order to overcome the heating effects of a high-temperature deposition process, thereby ensuring a uniform expansion and contraction rate of the shadow mask and the substrate.