发明名称 |
METHOD AND DEVICE FOR PEELING SEMICONDUCTOR WAFER |
摘要 |
PROBLEM TO BE SOLVED: To provide a method and a device for peeling semiconductor wafer by which the breakage of a semiconductor wafer can be prevented when peeling the wafer from a support. SOLUTION: The method of peeling the semiconductor wafer 30 stuck to the rigid support 20 through a sticking material 28 includes inserting steps (a and b) of inserting an inserting member 6 into the sticking material 28, and a vibrating step (c) of applying vibrations to the sticking material 28 by vibrating the inserting member 6 while the member 8 is biased in the direction in which the semiconductor wafer 30 is peeled from the support 20. COPYRIGHT: (C)2006,JPO&NCIPI |
申请公布号 |
JP2006032506(A) |
申请公布日期 |
2006.02.02 |
申请号 |
JP20040206700 |
申请日期 |
2004.07.14 |
申请人 |
TAIYO YUDEN CO LTD;RENESAS TECHNOLOGY CORP |
发明人 |
UENO MITSUO;NEMOTO YOSHIHIKO |
分类号 |
H01L21/683 |
主分类号 |
H01L21/683 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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