发明名称 |
Method for obtaining a thin, stabilized fluorine-doped silica layer, resulting thin layer, and use thereof in ophthalmic optics |
摘要 |
The method according to the invention comprises forming on a SiO<SUB>x</SUB>F<SUB>y </SUB>layer a silica SiO<SUB>2 </SUB>and/or metal oxide protective layer obtained through ion beam-assisted vapor phase deposition, comprising bombarding the layer being formed with a beam of positive ions formed from a rare gas, oxygen or a mixture of two or more of such gases, or through cathodic sputtering of a silicon or metal layer followed by an oxidation step of the silicon or the metal layer. Application to the production of antireflection coatings.
|
申请公布号 |
US2006023311(A1) |
申请公布日期 |
2006.02.02 |
申请号 |
US20050523951 |
申请日期 |
2005.02.08 |
申请人 |
ESSILOR INTERNATIONAL COMPANGNIE GENERALE D'OPTIQUE |
发明人 |
SCHERER KARIN;LACAN PASCALE;ROISIN PHILIPPE;BOSMANS RICHARD |
分类号 |
G02B5/08;G02C7/02;C23C14/10;C23C14/22;G02B1/10;G02B1/11;G02B17/00 |
主分类号 |
G02B5/08 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|