发明名称 Method for obtaining a thin, stabilized fluorine-doped silica layer, resulting thin layer, and use thereof in ophthalmic optics
摘要 The method according to the invention comprises forming on a SiO<SUB>x</SUB>F<SUB>y </SUB>layer a silica SiO<SUB>2 </SUB>and/or metal oxide protective layer obtained through ion beam-assisted vapor phase deposition, comprising bombarding the layer being formed with a beam of positive ions formed from a rare gas, oxygen or a mixture of two or more of such gases, or through cathodic sputtering of a silicon or metal layer followed by an oxidation step of the silicon or the metal layer. Application to the production of antireflection coatings.
申请公布号 US2006023311(A1) 申请公布日期 2006.02.02
申请号 US20050523951 申请日期 2005.02.08
申请人 ESSILOR INTERNATIONAL COMPANGNIE GENERALE D'OPTIQUE 发明人 SCHERER KARIN;LACAN PASCALE;ROISIN PHILIPPE;BOSMANS RICHARD
分类号 G02B5/08;G02C7/02;C23C14/10;C23C14/22;G02B1/10;G02B1/11;G02B17/00 主分类号 G02B5/08
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