发明名称 Laterales Leistungs-MOSFET mit einer Metallschicht zur Verminderung des verteilten Widerstandes und Verfahren zur Herstellung
摘要 To reduce the distributed resistance in an integrated circuit die, a relatively thick metal strap layer is deposited on a bus or other conductive path in the top metal layer. The metal strap layer is formed by etching a longitudinal channel in the passivation layer over the bus and plating a thick metal layer, preferably nickel, in the channel. The metal strap layer dramatically reduces the resistance of the bus. <IMAGE> <IMAGE> <IMAGE>
申请公布号 DE69533691(T2) 申请公布日期 2006.02.02
申请号 DE1995633691T 申请日期 1995.12.29
申请人 SILICONIX INC., SANTA CLARA 发明人 WILLIAMS, RICHARD K.
分类号 H01L21/3205;H01L21/8234;H01L23/482;H01L23/52;H01L23/528;H01L27/088;H01L29/10;H01L29/417;H01L29/78 主分类号 H01L21/3205
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