POLISHING DEVICE AND POLISHING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a polishing device and a method capable of improving nonuniformity in thickness between materials to be polished or on one material to be polished and facilitating end-point control of polishing.

SOLUTION: The polishing device has a polishing chamber 36 for polishing an object to be polished and a control device 34. A temperature sensor 48 for measuring a temperature of an atmosphere in the polishing chamber; a polishing table 12 having a polishing surface 10; and a nozzle 16 for feeding a polishing liquid to the polishing surface are provided in the polishing chamber. The temperature of the polishing liquid is controlled based on a value of a polishing target temperature relative to a temperature of a contacting surface of the object to be polished and the polishing surface inputted to the control device and the value measured by the temperature sensor 48.

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