发明名称 Apparatus for treating a wafer and a method therefor
摘要 <p>A wafer (10) processing unit, especially for laser marking or writing, comprises a displacement determining unit (9) to produce a signal, information or data on the difference between the target position for processing and the actual position determined by an alignment device. An independent claim is also included for a process for the above unit.</p>
申请公布号 EP1622196(A1) 申请公布日期 2006.02.01
申请号 EP20040018148 申请日期 2004.07.30
申请人 INNOLAS GMBH 发明人 BEHR, ANDREAS
分类号 H01L21/68;B23Q17/24;G05D3/12 主分类号 H01L21/68
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