发明名称 |
Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same |
摘要 |
A positive type resist composition for use in liquid immersion exposure comprises: (A) a resin having a monocyclic or polycyclic cycloaliphatic hydrocarbon structure, the resin increasing its solubility in an alkali developer by an action of acid; (B) a compound generating acid upon irradiation with one of an actinic ray and a radiation; (C) an alkali soluble compound having an alkyl group of 5 or more carbon atoms; and (D) a solvent. |
申请公布号 |
EP1621927(A2) |
申请公布日期 |
2006.02.01 |
申请号 |
EP20050014633 |
申请日期 |
2005.07.06 |
申请人 |
FUJI PHOTO FILM CO., LTD. |
发明人 |
KANDA, HIROMI;INABE, HARUKI |
分类号 |
G03F7/004;G03F7/039;G03F7/20 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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