发明名称 Soft magnetic film having a high magnetization, methof for manufacturing thereof and corresponding integrated circuit
摘要 <p>The method involves nitriding ferromagnetic nanograins rich in iron immersed in an amorphous substrate (SB), and selectively oxidizing the substrate. The nitriding is effectuated by reactive cathodic or ionic sputtering under magnetic field in the presence of nitrogen. The oxidation is effectuated by reactive sputtering in the presence of oxygen. The oxidation and nitriding are carried out simultaneously. Independent claims are also included for the following: (A) a thin soft magnetic film having high magnetization and insulation; and (B) an integrated circuit comprising a component utilizing a membrane incorporating a film.</p>
申请公布号 EP1622177(A1) 申请公布日期 2006.02.01
申请号 EP20050291583 申请日期 2005.07.25
申请人 STMICROELECTRONICS SA;COMMISSARIAT A L'ENERGIE ATOMIQUE 发明人 BOUCHE, GUILLAUME;ANCEY, PASCAL;VIALA, BERNARD;COUDERC, SANDRINE
分类号 H01F41/30;H01F10/00;H01F10/13;H01F10/14;H01F10/32;H01F17/00;H01F41/18;H01L23/552 主分类号 H01F41/30
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