摘要 |
High-purity trimethylaluminum has the following impurity contents: organosilicon components s 0.5 ppm, chlorine components s 20 ppm, hydrocarbon components s 1,000 ppm, Ca ‰¤ 0.05 ppm, Fe ‰¤ 0.05 ppm, Mg s 0.05 ppm, Na ‰¤ 0.05 ppm, Si (Si components other than the organosilicon components) s 0.07 ppm, Zn ‰¤ 0.05 ppm, and S s 0.05 ppm. The high-purity trimethylaluminum can be obtained by removing impurities from crude trimethylaluminum through distillation and evaporation. |
申请人 |
SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
TSUDERA, TAKANOBU;TANAKA, SHUJI;IWAI, DAISUKE;NISHIWAKI, HIROMI;HONMA, TAKAYUKI |