Projection exposure apparatus

摘要

A projection exposure apparatus with a small size and low cost suitable for repeated pattern exposure is disclosed. The apparatus comprises an illumination system (7) which irradiates light to a mask (4) including plural columns of a mask pattern for repeated exposure to a member (3) to form plural columns of an exposure pattern, a projection system (2) which projects light from the mask onto the member, an exposure stage (5) which moves the member, and a mask stage (1) which moves the mask. The light irradiation and step driving of the exposure stage for moving the member by a movement amount equal to n times a pitch of the columns of the exposure pattern are alternately performed. The mask is moved by a movement amount equal to n times a pitch of the columns of the mask pattern with step driving of the exposure stage in an early and later phases of the repeated exposure.