发明名称 |
Uer ces lignes |
摘要 |
A substrate includes fine lines. The fine lines are obtained according to a fine-line forming process, which includes a process of projecting light from above the substrate onto predetermined regions on a photosensitive material provided on the substrate and a developing process after the light projection process. A narrow-width portion is provided at an end portion of each of the fine lines in a longitudinal direction of the fine line. The width of the narrow-width portion is smaller than the width of a portion adjacent to the narrow-width portion. |
申请公布号 |
EP1215700(A3) |
申请公布日期 |
2006.02.01 |
申请号 |
EP20010129594 |
申请日期 |
2001.12.12 |
申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
UDA, YOSHIMI;ISHIWATA, KAZUYA;KUBO, SHINSAKU;WATANABE, YASUYUKI |
分类号 |
H01J9/02;G03F7/00;H01J1/316;H01J29/04;H01J31/12;H05K1/09;H05K3/02 |
主分类号 |
H01J9/02 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|