发明名称 Uer ces lignes
摘要 A substrate includes fine lines. The fine lines are obtained according to a fine-line forming process, which includes a process of projecting light from above the substrate onto predetermined regions on a photosensitive material provided on the substrate and a developing process after the light projection process. A narrow-width portion is provided at an end portion of each of the fine lines in a longitudinal direction of the fine line. The width of the narrow-width portion is smaller than the width of a portion adjacent to the narrow-width portion.
申请公布号 EP1215700(A3) 申请公布日期 2006.02.01
申请号 EP20010129594 申请日期 2001.12.12
申请人 CANON KABUSHIKI KAISHA 发明人 UDA, YOSHIMI;ISHIWATA, KAZUYA;KUBO, SHINSAKU;WATANABE, YASUYUKI
分类号 H01J9/02;G03F7/00;H01J1/316;H01J29/04;H01J31/12;H05K1/09;H05K3/02 主分类号 H01J9/02
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