| 摘要 |
A stencil mask for semiconductor processes comprises: (a) a thin film conductor (2) with openings (7) cut into the film; (b) an insulator film (4) formed in the region of the thin film conductor with the exclusion of the openings; (c) a conductor support (3A) formed on the insulator film; and (d) a conductor element (6) formed so that it crosses the insulator film and connects the conductor support and the thin film conductor electrically. An Independent claim is also included for the production of a stencil mask. |
