发明名称 |
Electron beam inspection system and inspection method and method of manufacturing devices using the system |
摘要 |
An electron beam inspection system of the image projection type includes a primary electron optical system for shaping an electron beam emitted from an electron gun into a rectangular configuration and applying the shaped electron beam to a sample surface to be inspected. A secondary electron optical system converges secondary electrons emitted from the sample. A detector converts the converged secondary electrons into an optical image through a fluorescent screen and focuses the image to a line sensor. A controller controls the charge transfer time of the line sensor at which the picked-up line image is transferred between each pair of adjacent pixel rows provided in the line sensor in association with the moving speed of a stage for moving the sample.
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申请公布号 |
US6992290(B2) |
申请公布日期 |
2006.01.31 |
申请号 |
US20010985317 |
申请日期 |
2001.11.02 |
申请人 |
KABUSHIKI KAISHA TOSHIBA |
发明人 |
WATANABE KENJI;SOBUKAWA HIROSI;NOJI NOBUHARU;SATAKE TOHRU;YOSHIKAWA SHOJI;KARIMATA TSUTOMU;NAKASUJI MAMORU;HATAKEYAMA MASAHIRO;MURAKAMI TAKESHI;YAMAZAKI YUICHIRO;NAGAHAMA ICHIROTA;NAGAI TAKAMITSU;SUGIHARA KAZUYOSHI |
分类号 |
H01J37/26;H01J37/22;H01J37/244;H01J37/28 |
主分类号 |
H01J37/26 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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