Position detecting method and apparatus, exposure apparatus and device manufacturing method

摘要

A method of detecting relative position of a reflecting-type reticle and a substrate with the reticle having an alignment mark thereon. The method includes a holding step of holding the reticle on a reticle stage which has a reference mark, and a detection step of detecting position of the alignment mark on the reticle based on alignment light reflected from the alignment mark and detecting relative position between the reference mark on the reticle stage and the alignment mark.