Method of achieving CD linearity control for a full-chip cpl manufacturing

摘要

The data representing patterns comprising features (10), are obtained. A number of distinct zones are defined based on the critical dimensions of the features. Each feature is categorized into one of the zones. The mask pattern is modified for each feature categorized into a preset distinct zone. Independent claims are also included for the following: (1) apparatus for generating mask; and (2) computer program product comprising program for generating files corresponding to mask.