Semiconductor device having spacer pattern and method of forming the same

摘要

The present invention provides a semiconductor device having a spacer pattern and methods of forming the same that includes a lower interconnection pattern on a semiconductor substrate. A lower interconnection spacer covers sidewalls of the lower interconnection pattern. Spacer patterns cover the lower interconnection spacer of the lower interconnection pattern and disposed on the semiconductor substrate. An upper interconnection pattern is formed between the spacer patterns.