| 摘要 |
The invention is directed to an arrangement for metering target material for the generation of short-wavelength electromagnetic radiation from an energy beam induced plasma, in particular X radiation and EUV radiation. The object of the invention is to find a novel possibility for metering target material for the generation of short-wavelength electromagnetic radiation from an energy beam induced plasma which makes it possible to provide reproducibly supplied mass-limited targets in such a way that only the amount of target material for plasma generation that can be effectively converted to radiating plasma in the desired wavelength region arrives in the interaction chamber and, therefore, debris generation and the gas burden in the interaction chamber are minimized. This object is met, according to the invention, in that an injection device is provided for target generation, wherein means are arranged upstream of the nozzle in a nozzle chamber for a defined, temporary pressure increase in order to introduce an individual target into the interaction chamber exclusively when required, and an antechamber is arranged around the nozzle for generating a quasistatic pressure upstream of the interaction chamber, wherein an equilibrium pressure in the antechamber prevents the escape of target material as long as there is no pressure increase in the nozzle chamber.
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