发明名称 |
Semiconductor device having measuring pattern to improve measuring reliability and Method of measuring semiconductor device using the measuring pattern |
摘要 |
The semiconductor device comprises a measurement pattern (42) of fixed surface cross-section formed on scribed area of semiconductor substrate. A dummy pattern (46) for decreasing empty space in surface cross-section of measurement pattern, is formed within measurement pattern. - An INDEPENDENT CLAIM is also included for semiconductor device measurement method. |
申请公布号 |
KR100546330(B1) |
申请公布日期 |
2006.01.26 |
申请号 |
KR20030035603 |
申请日期 |
2003.06.03 |
申请人 |
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发明人 |
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分类号 |
H01L21/027;H01L21/66;H01L21/822;H01L23/544;H01L27/04 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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