| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an evaluating method for exposure apparatuses whereby the more quantitative evaluations than conventional ones are made possible. <P>SOLUTION: The evaluating method for exposure apparatuses has a first process (S102) for memorizing the operational sequences required when performing the exposures of patterns to partitioned regions, a second process (S103) for operating a scanning type exposure apparatus while altering the settings of the operational parameters relative to exposure operations which are included in the abovementioned operational sequences, a third process (S104) for measuring by using the measuring devices provided in the scanning type exposure apparatus with the informations relative to a first characteristic of the scanning type exposure apparatus at the every alteration of the operational parameters, when operating the scanning type exposure apparatus in the second process; and a fourth process (S105) for performing the estimating computations (simulations) of the predetermined performances of the scanning type exposure apparatus, based on the plurality of informations relative to the first characteristic which have been measured in the third process. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
