| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a lithography apparatus that employs an immersion aligner and is capable of suppressing variations in temperature of a wafer associated with transfer of the wafer in equipment. <P>SOLUTION: The lithography apparatus comprises a resist processing device 1, the immersion aligner 2, a transfer device 3 coupled to the resist processing device 1 and aligner 2 for transferring a wafer 5 between the resist processing device 1 and aligner 2, and a temperature and moisture control unit 4 for controlling the temperature and moisture within the transfer device 3 based on the temperature and moisture within the aligner 2. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
