摘要 |
The invention pertain to novel photoacid generator compounds of the formula (I, II or III), Wherein R<SUB>1</SUB> is for example C<SUB>1</SUB>-C<SUB>18</SUB>alkylsulfonyl or phenylsulfonyl, phenyl-C<SUB>1</SUB>-C<SUB>3</SUB>alkylsulfonyl, , naphthylsulfonyl, anthracylsulfonyl or phenanthrylsulfonyl, all optionally substituted, or R<SUB>1</SUB> is a group (a, b or c); X<SUB>1</SUB>, X<SUB>2</SUB> and X<SUB>3 </SUB>independently of each other are O or S; R'<SUB>1</SUB> is e.g. phenylenedisulfonyl, naphthylenedisulfonyl, diphenylenedisulfonyl, or oxydiphenylenedisulfonyl, all optionally substituted; R<SUB>2</SUB> is halogen or C<SUB>1</SUB>-C<SUB>10</SUB>haloalkyl; X is halogen; Ar<SUB>1</SUB> is for example biphenylyl or fluorenyl, or is substituted naphthyl; Ar'<SUB>1</SUB> is heteroarylene, optionally substituted; R<SUB>8</SUB>, R<SUB>9</SUB>, R<SUB>10</SUB> and R<SUB>11</SUB> for example are C<SUB>1</SUB>-C<SUB>6</SUB>alkyl which is unsubstituted or substituted by halogen; or R<SUB>8</SUB>, R<SUB>9</SUB> and R<SUB>10</SUB> are phenyl which is unsubstituted or substituted by C<SUB>1</SUB>-C<SUB>4</SUB>alkyl or halogen; or R<SUB>10</SUB> and R<SUB>11</SUB> together are 1,2-phenylene or C<SUB>2</SUB>-C<SUB>6</SUB>alkylene which is unsubstituted or substituted by C<SUB>1</SUB>-C<SUB>4</SUB>alkyl or halogen. |
申请人 |
CIBA SPECIALTY CHEMICALS HOLDING INC.;YAMATO, HITOSHI;ASAKURA, TOSHIKAGE;HINTERMANN, TOBIAS |
发明人 |
YAMATO, HITOSHI;ASAKURA, TOSHIKAGE;HINTERMANN, TOBIAS |