FLUOROCARBON FILM AND METHOD FOR FORMING SAME

摘要

Disclosed is a fluorocarbon film having fine pores. A method for forming a fluorocarbon film is characterized by comprising a step (SA1) wherein a fluorocarbon film is deposited on a substrate by introducing a mixed gas containing a first fluorinated carbon gas and a second fluorinated carbon gas onto the substrate placed in a chamber, and a step (SA2) wherein pores are formed in the fluorocarbon film by selectively removing a volatile component contained in the fluorocarbon film. It is particularly preferable that the pore-forming step (SA2) includes a sub-step for cleaning the fluorocarbon film with a supercritical fluid.