DIRECT INJECTION CHEMICAL VAPOR DEPOSITION METHOD

摘要

The present invention provides a method for vaporizing and transporting precursor molecules to a process chamber for deposition of thin films on a substrate. The methods include CVD solvents that comprise ionic liquids. A desired precursor is dissolved in a selected CVD solvent comprising an ionic liquid. The solvent and precursor solution are injected into a packed vaporizer having a counter-current carrier gas flow. The carrier gas strips the precursor from the ionic liquid and transports the precursor molecules in the vapor phase to a deposition chamber. Conventional deposition processes may be used to deposit the desired thin film on a substrate.