发明名称 Mirror arrangement and method of manufacturing thereof, optical system and lithographic method of manufacturing a miniaturized device
摘要 A mirror arrangement for reflecting electromagnetic radiation, the mirror arrangement comprising: a substrate having a mirror side facing towards the radiation to be reflected and a back side opposite to the mirror side, wherein a mirror surface is provided on the mirror side and wherein an actuator arrangement for generating a deformation of the substrate is mounted on the back side of the substrate, wherein the actuator arrangement comprises at least one active layer having an areal adhering contact with a portion of the back side of the substrate; wherein the at least one active layer has a first layer thickness at a first location within the portion and a second layer thickness at a second location disposed at a distance from the first location within the portion, wherein the first layer thickness differs from the second layer thickness by more than 1%; and wherein the at least one active layer comprises at least one of a ferroelectric material, a piezoelectric material, a magnetostrictive material, an electrostrictive material and a memory metal alloy.
申请公布号 US2006018045(A1) 申请公布日期 2006.01.26
申请号 US20040971002 申请日期 2004.10.25
申请人 CARL ZEISS SMT AG 发明人 MOELLER TIMO;ROSS-MESSEMER MARTIN;HOELLER FRANK;BLEIDISTEL SASCHA
分类号 G02B5/08;G02B5/10;G03F7/20 主分类号 G02B5/08
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