METHODS OF AND APPARATUSES FOR MAINTENANCE, DIAGNOSIS, AND OPTIMIZATION OF PROCESSES
摘要
<p>One aspect of the present invention is a method of monitoring processes, optimizing processes, and diagnosing problems in the performance of a process tool for processing a workpiece. Another aspect of the present invention is a system configured for monitoring processes, optimizing processes, and diagnosing problems in the performance of a process tool for processing a workpiece. One embodiment of the present invention includes a software program that can be implemented in a computer for optimizing the performance of a process tool for processing a workpiece.</p>
申请公布号
WO2006010128(A2)
申请公布日期
2006.01.26
申请号
WO2005US24580
申请日期
2005.07.11
申请人
ONWAFER TECHNOLOGIES, INC.
发明人
MACDONALD, PAUL, D.;KRUGER, MICHIEL;WELCH, MICHAEL;FREED, MASON, L.;SPANOS, COSTAS, J.
