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发明名称
Apparatus of semiconductor device attaining improved overlay margin and manufacturing method thereof
摘要
申请公布号
KR100546302(B1)
申请公布日期
2006.01.26
申请号
KR19990057624
申请日期
1999.12.14
申请人
发明人
分类号
H01L21/768
主分类号
H01L21/768
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代理人
主权项
地址
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