| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photoresist composition having excellent coating uniformity and stain inhibitory properties after coating so that it can be easily applied to real industrial fields and it can improve working environments due to the reduction of amounts to be consumed, the decrease of time to be required for manufacture, etc., when manufactured on a large scale. <P>SOLUTION: The photoresist composition comprises (a) a novolak resin, (b) a diazide compound and (c) a solvent containing propylene glycol methyl ether acetate and trimethylpentanediolmonoisobutylate. A method for manufacturing a liquid crystal display or a semiconductor device using the same is also provided. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
