发明名称 DISCHARGE TYPE GAS TREATMENT DEVICE
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a discharge type gas treatment device allowing start of discharge at a further lower voltage, and easy in controlling voltage to be inputtd for continuing discharge. <P>SOLUTION: This discharge type gas treatment device 10 is provided with a conductive electrode 15 having protrusions 15a; a counter electrode 16 facing the conductive electrode 15; a dielectric 17 covering the conductive electrode 15 side of the counter electrode 16; and a discharge power source 13 applying required voltage between the conductive electrode 15 and counter electrode 16 to generate discharge plasma for cleaning treating gas. The distance between the protrusions 15a and dielectric 17 is set to a required distance or less to start discharge from the vicinity of the protrusions 15a. <P>COPYRIGHT: (C)2006,JPO&NCIPI</p>
申请公布号 JP2006021081(A) 申请公布日期 2006.01.26
申请号 JP20040199537 申请日期 2004.07.06
申请人 TOSHIBA CORP 发明人 HAYASHI KAZUO;NODA ETSUO;YASUI SUKEYUKI;TAKAHASHI YASUHIRO;ARAKI KUNIYUKI
分类号 B01D53/56;B01D53/38;B01D53/74;B01J19/08;F01N3/08 主分类号 B01D53/56
代理机构 代理人
主权项
地址