发明名称 |
Electron beam lithography method, patterned master carrier for magnetic transfer, lithography method for patterned master carrier for magnetic transfer, and method for producing performatted magnetic recording media |
摘要 |
A fine pattern having first elements within track widths and second elements, which are shifted half a track pitch from the first elements, are drawn across the entire surface of a disk accurately and at high speed. A transfer pattern for a magnetic transfer master carrier is drawn by scanning an electron beam on a disk coated with resist. The first elements and the second elements, which are shifted half a track pitch such that they straddle adjacent tracks, are drawn. While the disk is rotated unidirectionally, the electron beam is deflected in the radial direction within a single track of the disk to draw the first elements. Deflection of the electron beam in the radial direction is shifted half a track, to draw the second elements that straddle adjacent tracks at the same time.
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申请公布号 |
US2006017020(A1) |
申请公布日期 |
2006.01.26 |
申请号 |
US20050170141 |
申请日期 |
2005.06.30 |
申请人 |
FUJI PHOTO FILM CO., LTD. |
发明人 |
USA TOSHIHIRO;KOMATSU KAZUNORI |
分类号 |
G21K5/10;G21G5/00 |
主分类号 |
G21K5/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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