发明名称 FLUORINE-CONTAINING POLYMERIZABLE ESTER COMPOUND, ITS MANUFACTURING PROCESS, POLYMER, PHOTORESIST COMPOSITION AND METHOD OF IMAGING
摘要 <P>PROBLEM TO BE SOLVED: To provide a new fluorine-containing polymerizable ester compound which is useful as a raw material for functional materials, medicines, agricultural chemicals and the like and particularly useful for the monomer for the polymer to manufacture the base resin for radiation-sensitive resist composition. <P>SOLUTION: The fluorine-containing polymerizable ester compound is expressed by general formula (1) or (2). Wherein, R<SP>1</SP>is a hydrogen atom, a methyl group or a trifluoromethyl group; R<SP>2</SP>is a divalent hydrocarbon group; R<SP>3</SP>is a hydrogen atom, a univalent hydrocarbon group; R<SP>2</SP>and R<SP>3</SP>may couple with each other to form a ring together with the carbon atoms with which they are bonded; R<SP>4</SP>is a hydrogen atom, a hydroxy group or a univalent hydrocarbon group; and R<SP>5</SP>is an acid-unstable group. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006022259(A) 申请公布日期 2006.01.26
申请号 JP20040203195 申请日期 2004.07.09
申请人 SHIN ETSU CHEM CO LTD 发明人 KANOU TAKESHI;WATANABE TAKESHI;TACHIBANA SEIICHIRO;HATAKEYAMA JUN
分类号 C08F20/26;C07C67/08;C07C67/29;C07C69/653;G03F7/039 主分类号 C08F20/26
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