| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a conveyance tool for a photomask substrate by which clamp force can be improved and a large-size heavy weight photomask substrate can be easily clamped and conveyed without damaged. <P>SOLUTION: The conveyance tool for a photomask substrate includes: an outer arm and an inner arm the total length of which can be adjusted: a movable work clamp mechanism which is disposed near the end of the outer arm and has a movable clamp part having an elastic clamp member capable of clamping one end of a photomask; and a fixed work clamp mechanism having which is disposed near the end of the inner arm and has a fixed clamp part to clamp the other end face of the substrate. The movable work clamp mechanism has a toggle mechanism to which a clamp handle is attached for allowing the movable clamp part to advance or retreat. <P>COPYRIGHT: (C)2006,JPO&NCIPI</p> |
