发明名称 Electron beam apparatus
摘要 An electron beam ( 4 ) to be irradiated onto a sample ( 10 ) is two-dimensionally scanned by a scanning coil ( 9 ), and secondary electrons generated from the sample ( 10 ) by the scanning are detected by a secondary electron detector ( 13 ). A deflection coil ( 15 ) for image shifting is used for electrically deflecting the primary electron beam to shift a field of view for image shift in an arbitrary direction by an arbitrary amount. By the image shift, the primary electron beam ( 4 ) to be irradiated onto the sample is energy dispersed to degrade the resolution. However, an ExB field producer ( 30 ) for dispersion control gives the primary electron beam energy dispersion in the opposite direction and having the equal magnitude. Therefore, the energy dispersion produced in the primary electron beam by the image shift is automatically corrected.
申请公布号 US2006016992(A1) 申请公布日期 2006.01.26
申请号 US20050234300 申请日期 2005.09.26
申请人 SATO MITSUGU;TODOKORO HIDEO 发明人 SATO MITSUGU;TODOKORO HIDEO
分类号 G21K7/00;G01N23/00;G01Q30/02;H01J37/05;H01J37/147;H01J37/153;H01J37/28 主分类号 G21K7/00
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