发明名称 EXPOSURE METHOD AND METHOD FOR PRODUCING DEVICE
摘要 Disclosed is an exposure method wherein a substrate is adequately exposed to light while maintaining a liquid in a desired state. The upper surface (1A) of a base (1) constituting a substrate (P) to be exposed to light via a liquid has an effective region (4) which is covered with a photosensitive material (2). At least a part of the surface of the base (1) around the effective region (4) is covered with a first material (3) so that the surface of the base (1) is not in contact with the liquid around the effective region (4).
申请公布号 WO2006009169(A1) 申请公布日期 2006.01.26
申请号 WO2005JP13311 申请日期 2005.07.20
申请人 NIKON CORPORATION;FUJIWARA, TOMOHARU;NAGASAKA, HIROYUKI 发明人 FUJIWARA, TOMOHARU;NAGASAKA, HIROYUKI
分类号 H01L21/027;G03F7/20;G03F7/38 主分类号 H01L21/027
代理机构 代理人
主权项
地址