发明名称 |
EXPOSURE METHOD AND METHOD FOR PRODUCING DEVICE |
摘要 |
Disclosed is an exposure method wherein a substrate is adequately exposed to light while maintaining a liquid in a desired state. The upper surface (1A) of a base (1) constituting a substrate (P) to be exposed to light via a liquid has an effective region (4) which is covered with a photosensitive material (2). At least a part of the surface of the base (1) around the effective region (4) is covered with a first material (3) so that the surface of the base (1) is not in contact with the liquid around the effective region (4). |
申请公布号 |
WO2006009169(A1) |
申请公布日期 |
2006.01.26 |
申请号 |
WO2005JP13311 |
申请日期 |
2005.07.20 |
申请人 |
NIKON CORPORATION;FUJIWARA, TOMOHARU;NAGASAKA, HIROYUKI |
发明人 |
FUJIWARA, TOMOHARU;NAGASAKA, HIROYUKI |
分类号 |
H01L21/027;G03F7/20;G03F7/38 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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