发明名称 MANUFACTURING METHOD OF SEMICONDUCTOR APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To provide a technology capable of manufacturing semiconductor apparatus on a product line thereof wherein man-hour saving is attained by smoothly automating reticule carrying. <P>SOLUTION: A reticule is contained in a reticule pod to relate the reticule to the reticule pod on a host system. Then the reticule pod is carried to an exposure apparatus. When the reticule pod reaches the exposure apparatus, the reticule and the reticule pod are related to each other on the exposure apparatus. Succeedingly, the reticule is extracted from the reticule pod and thereafter foreign material inspection is applied to the reticule. When the result of the foreign material inspection is good (S110), the exposure apparatus transmits event information denoting that the result of the foreign material inspection is good to the host system (S114), and the relation between the reticule pod and the reticule on the exposure apparatus is cancelled (S115). Upon the receipt of the event information, the host system cancels the relation between the reticule pod and the reticule on itself (S116). <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006024850(A) 申请公布日期 2006.01.26
申请号 JP20040203430 申请日期 2004.07.09
申请人 RENESAS TECHNOLOGY CORP 发明人 KOBAYASHI YOSHIAKI
分类号 H01L21/027;G03F1/50;G03F1/68;G03F7/20 主分类号 H01L21/027
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